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Atomic Layer Deposition for Nanotechnology
Atomic Layer Deposition for Nanotechnology
Author: Arthur Sherman
This monograph is the first text to review the subject of Atomic Layer Deposition (ALD) comprehensively. It not only covers its application to microelectronics, but also many important new and emerging applications in Nanotechnology. It is the culmination of over 10 years of pioneering research and development by the author. Not only does it cov...  more »
ISBN-13: 9780981466378
ISBN-10: 0981466370
Publication Date: 9/24/2008
Pages: 256
Edition: First
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Publisher: Ivoryton Press
Book Type: Paperback
Other Versions: Hardcover
Members Wishing: 0
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