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IEEE Symposium on Vlsi Technology 2000
IEEE Symposium on Vlsi Technology 2000
Author: IEEE Electron Devices Society
These conference prodeedings cover such topics as: copper interconnects; novel devices; high-K dielectrics; process technology; embedded DRAM; gate electrode engineering; DRAM cells; gate oxide scaling and reliability; DRAM capacitors; and high performance RF.
ISBN-13: 9780780363069
ISBN-10: 078036306X
Pages: 242
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Publisher: Institute of Electrical & Electronics Enginee
Book Type: Hardcover
Members Wishing: 0
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