Skip to main content
PBS logo
 
 

Search - Tribology In Chemical-Mechanical Planarization

Tribology In Chemical-Mechanical Planarization
Tribology In ChemicalMechanical Planarization
Author: Hong Liang, David Craven
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language tha...  more »
ISBN-13: 9780824725679
ISBN-10: 0824725670
Publication Date: 3/1/2005
Pages: 200
Edition: 1
Rating:
  ?
0 stars, based on 0 rating
Publisher: CRC
Book Type: Hardcover
Members Wishing: 0
Reviews: Amazon | Write a Review


Genres:


Back to the Top ↑
By using this Web site, you confirm that you have read, understood, and agreed to be bound by the Terms of Use. As an Amazon Associate we earn from qualifying purchases.
US Patent Number 7,877,315 | Copyright © 2004 - 2024 PaperBackSwap.com. All Rights Reserved.