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Search - Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons
Atomic Layer Deposition Principles Characteristics and Nanotechnology Applicatons
Author: Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS...  more »
ISBN-13: 9781118062777
ISBN-10: 1118062779
Publication Date: 5/28/2013
Pages: 272
Edition: 2
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Publisher: Wiley-Scrivener
Book Type: Hardcover
Members Wishing: 0
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