Skip to main content
PBS logo
 
 

Search - Extreme Ultraviolet Lithography

Extreme Ultraviolet Lithography
Extreme Ultraviolet Lithography
Author: Banqiu Wu, Ajay Kumar
Master Extreme Ultraviolet Lithography TechniquesProduce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers an...  more »
ISBN-13: 9780071549189
ISBN-10: 0071549188
Publication Date: 4/3/2009
Pages: 482
Edition: 1
Rating:
  ?
0 stars, based on 0 rating
Publisher: McGraw-Hill Professional
Book Type: Hardcover
Members Wishing: 0
Reviews: Amazon | Write a Review



Back to the Top ↑
By using this Web site, you confirm that you have read, understood, and agreed to be bound by the Terms of Use. As an Amazon Associate we earn from qualifying purchases.
US Patent Number 7,877,315 | Copyright © 2004 - 2024 PaperBackSwap.com. All Rights Reserved.